Consul General Otsuki Attends US-JOINT Opening Ceremony

2026/4/27
Remarks by Mr. Takahashi, CEO for Resonac
Remarks by Deputy Director General Nishikawa, METI
On Monday, April 20, Consul General Kotaro Otsuki attended and delivered remarks at the opening ceremony for the US-JOINT R&D site, a semiconductor development facility located in Union City, California. The opening of the site, operated by Japanese semiconductor company Resonac, marked an important milestone for US-JOINT, a consortium of Japanese and U.S. semiconductor materials and equipment companies that aims to encourage co-creation in the Packaging process between semiconductor companies and their business customers. Aside from Resonac, US-JOINT members include; Azimuth; KLA; Kulicke & Soffa; MEC; Moses Lake Industries; NAMICS; TOK; TOPPAN; TOWA; ULVAC and 3M.

The event began with opening remarks from Resonac CEO Hidehito Takahashi, followed by speeches from representatives of other US-JOINT member companies. There were also remarks by Mr. Kazumi Nishikawa, Deputy Director General for Semiconductor Policy at Japan’s Ministry of Economic Trade and Industry (METI); Ms. Emily Desai, Chief Deputy Director of the California Governor’s Office of Business and Economic Development (GO-Biz); and Union City Mayor Gary Singh.

Following these presentations, attendees toured the facilities at the site, which included cutting-edge technology for developing and testing semiconductor materials. Guests enjoyed networking with various local government and semiconductor industry representatives.
Remarks by Consul General Otsuki
Group photo of speakers
Ribbon cutting ceremony
Guests view semiconductor materials during facility tour

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